Metryx was formed with a view to bringing a significant change to semiconductor measurement technology.

This significant change is now installed and providing SPC to leading edge 300mm volume production processes. This innovative metrology utilises the simplest of measurement parameters and the very basics of physics – everything has a mass and undergoes mass change during process.

Metryx Mass Metrology...on PRODUCT WAFER measurement, LOW Cost of Ownership, HIGH RoI and ATOMIC LEVEL repeatability...

Mass & Weight Repeatability Data 300mm Wafers

 

Mass Metrology:  Repeatable and Precise

Metryx mentor technology is based on a thorough understanding of the forces behind the inaccuracy and variability in traditional weight measurement.

Through the use of force measurement, environmental measurement and precision engineering these variable forces have been removed.

The result is a mass measurement with a resolution of 10µg and a dynamic repeatability of 80µg (1σ) equivalent to less than 1Å blanket film of tantalum on a 300mm wafer.

Metryx Product Range - High Precision Mass Metrology Tools

MASS CHANGE: A DIRECT MEASUREMENT OF PROCESS PERFORMANCE

The Metryx mentor range is an in-line process monitoring solution which rapidly identifies production wafer trends and excursions. Monitoring the mass change for any process step is an effective in-line check, revealing the true wafer mean; while flagging bad wafers.

Key Features of Metryx Mass Metrology tools:

• On-Product Measurement

• Non-invasive

• Atomic level accuracy

• Applicable to all process modules - deposition, etch and CMP, on metals and dielectrics

• High throughput in-line solution

• Self-contained corroboration of metrology result

• No monitor wafers or test sites required

• Low CoO

• User friendly software with recipe editing and configurable user security

The measurement encompasses etch depth & profile, material composition, deposition step coverage or gap-fill result. Metryx enables increased metrology coverage on product wafers without compromising throughput, allowing complex, analytical metrology tools to be effectively applied where required on failed wafers.

 

Metryx mentor OC23 Innovative Metrology intended for 150/200mm wafer production environment Key Features Fully Automatic Fully SECS/GEM compliant Brooks Robot with safety light curtain 150mm to 200mm wafer handling from open cassette Throughput: Up to 60 wafers per hour Resolution 10µg (displayed) Repeatability: <0.24mg (3 sigma) CE compliant

Metryx mentor SF3 Single FOUP Mass Metrology tool for up to 300mm wafers Key Features Fully Automatic 300mm Semi-Standard Compliant Automation & User Interface Software Single Load Port: Brooks Fixload 6M with Mapper Brooks Robot Mini-Environment Single 300mm FOUP 200mm Compatible with FOUP Adaptor Throughput: Up to 60 wafers per hour Resolution 10µ (displayed) Repeatability: <0.24mg (3sigma) CE, S2 & S8 Compliant

Metryx mentor SS2 Single SMIF In-line metrology tool for device manufacturing, enhancing productivity Key Features Fully Automatic E30 SEMI Standard Compliant Host Automation E95 SEMI Standard Compliant User Interface Software Single Load Port: Brooks SMIFLoad Express Brooks Robot Mini-Environment Single 200mm SMIF Throughput: Up to 60 wafers per hour Resolution 10µ (displayed) Repeatability: <0.24mg (3sigma)

Metryx mentor DF3 Dual FOUP 300mm In-line metrology tool for high volume device manufacturing, enhancing productivity. Key Features Fully Automatic, Host-Integrated 300mm Semi-Standards Compliant Automation & User Interface software Dual Brooks Fixload 6M Load Ports with Mapper Brooks Robot enclosed in Mini Environment Dual 300mm FOUPs Throughput: Up to 60 wafers per hour Resolution: 10µg (displayed) Repeatability: <0.08mg (1σ) CE, S2 & S8 Compliant